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TSAI LEE & CHEN congratulation





Our patent engineers
 succeeded in the 2016 (P.R.) China Patent Bar Examination.

Ms. Phoebe S.H. Yeh
Ms. Scarlett Tu
Ms. Shih-Ya Ni
Ms. Pi-Fen Hsu
Ms. Doris H.C. Lee
Mr. Ali Y.C. Liao
Mr. Dillon T.C. Cheng
Mr. Shou-Ling Sui
Mr. Shih-Yuan Liu

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